香港电子器材有限公司
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  • 参考报价:电议
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    产地:丹麦
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    NIL**产品

    小型纳米压印机

    产品简介:

    Process is controlled by a programmable PLC with touch screen user interface.

    User can customize process parameters.

    Wafer and Mold are held by vacuum chuck

    UV curable imprint polymer compatible with traditional photolithography process

    工艺参数

    Wafer size 4 in

    Imprintable wafer area 2 in

    Imprint pressure 0 - 25 PSI (upgradable to 100 PSI imprint pressure)

    Mold substrate size 5 x 0.090 in

    Typical imprint throughput < 5 minutes/wafer

    设备尺寸及环境要求

    Controller Platform

    Dimension 5.8 x 16.5 x 12 in 17 x 16 x 15 in

    Weight 18.5 LB 45 LB

    Environment 10 - 35 C, 65% 10 - 35 C, 65%

    Facility requirements

    Filtered Pressure source 70 - 100 PSI

    Vacuum source <-14 PSI

    Power 110-220V, 2A, 50/60 Hz

    Clean-room class 1000 or better