美国OAI光刻机 5000E

详细介绍

型号5000E大面积光刻机用于基板和显示器

OAI 5000E型大面积掩光刻机是一种先进的高性能，全自动掩模对准器和曝光工具，可为大型平板应用提供超精密，**，亚微米对准和分辨率。 其灵活的设计允许在各种基材（圆形或方形）上印刷高达300mm或20“×20”。 曝光系统兼容近，中，或深紫外范围的光刻胶，并具有计算机控制的LED显微镜照明，在不太理想的观察环境中观察。

Model 5000E Large Area Mask Aligner for Substrates and Displays

The OAI Model 5000E Large Area Mask Aligner is an advanced， high-performance， fully-automated mask Aligner and exposure tool that delivers ultra precise， Topside， sub-micron alignment and resolution for large， flat panel applications. Its flexible design allows printing on various substrates - round or square - up to 300mm or 20”x20”. The exposure system is compatible with photo resist in Near， Mid， or Deep UV range， and features computer-controlled LED microscope lighting for viewing in less-than-ideal viewing environments.